Emby / Etch
3D integration and process effects in superconducting qubit devices
Advanced multiple patterning technologies for high density hexagonal hole arrays
Atomic level control of pattern fidelity during SAC etch
Contact local CD uniformity optimization through etch shrink
Directional and selective patterning of EUV absorbers
Effect of surface temperature on GeSbTe damage formation during plasma processing
Etch and deposition co-optimization- a pathway to enabling high aspect ratio
Key challenges and solutions in forthcoming device scaling
LER reduction strategies for EUV self-aligned double patterning (SADP)
Module-level material engineering for continued DRAM scaling
Novel bottom-up organic mandrel growth to enable organic mandrel EUV SADP for sub-5nm node technologies
Quasi-atomic layer etching of Si and nitride hard mask with Cl2 based chemistry
Reactive ion beam etch of slanted gratings for augmented reality_2
Selective patterning using deposition and etch- case of area selective deposition