Emby / Novel Patterning
Addressing NIL integration for semiconductor device manufacturing
Atomic precision fabrication of quantum devices down to the single atom regime
Curvilinear data format working group for MBMW era
Design of a tomographic projection lithography process for roll-to-roll fabrication of
Design of block copolymers for directed self-assembly
Digital scanner, optical maskless exposure tool with DUV solid state laser
Diversifying the patterning landscape in block copolymer self-assembly
DNA origami- the bridge from top to bottom
DSA process optimization for high volume manufacturing
Etch developments in response to DSA challenges
EUV mask process development using MBMW
High-speed in-line optical angular scatterometer for high-throughput roll-to-roll nanofabrication
Improvement of productivity by spin coating nanoimprint lithography
Integration of sub 50 nm features based on EVG SmartNIL for 8-inch substrates
Introduction to imec's AttoLab for ultrafast kinetics of EUV exposure processes and ultra-small pitch lithography
Lloyd’s mirror interference lithography below a 22-nm pitch with an accessible, tabletop, 13.5 nm high-harmonic EUV source
MBMW exposure optimization for EUV mask stacks
Micro LED displays- technology and manufacturing challenges
Multi-beam mask writer in EUV era- challenges and opportunities
Multi-beam mask writer MBM
Multi-field imprint technology- enabling the productivity enhancement of NIL
Nanoimprint performance improvements for high volume semiconductor device manufacturing
Nanoimprint template development by new fabrication method and its application
Nanopositioning and -fabrication using the Nano Fabrication Machine with a positioning range up to Ø 100 mm
Nanoscale 2D and
A new generation cost-efficient laser mask writer for mature semiconductor nodes
A novel method for generating linear structured illumination using phase modulation