Emby / AL2021
0.33 NA EUV systems for high-volume manufacturing
Advances in defect performance in metal oxide photoresists for EUV lithography
AL2021
Analysis of dissolution kinetics of poly(4-hydroxystyrene) with different molecular weight distributions in alkaline aqueous solution using machine learning
Chemically-amplified backbone scission (CABS) resist for EUV lithography
Chemistry working for lithography- the Marangoni-effect-based single layer for enhanced planarization
Design considerations for chemically amplified EUV resist materials
Development of high-chi directed self-assembly process based on key learning from PS-b-PMMA system
Development of metal purifiers specific to lithography materials
Development of metal-organic cluster based negative tone resist- pre-screened through the helium-ion beam prelude to extreme ultraviolet lithography (EUVL) applications
Effect of high NA βhalf-fieldβ printing on overlay error
Electron-induced chemistry fundamental to state-of-the-art nanotechnology
Enhancing lithographic performance by new EUV photomask materials
Etch
EUV
EUV dark field lithography- extreme resolution by blocking 0th order
EUV defect reduction activities using coater_developer and etching technique
EUV lithographic process enablement with novel litho track hardware
EUV lithography- past, present and future
EUV resist performance enhancement by UV flood exposure for high NA EUV lithography
Fundamental study of polymer dynamic behavior in resist processing
The future of compute- how the data transformation is reshaping VLSI
High contact angle embedded barrier layer materials for next-generation 193 immersion lithography
High performance filtration for bulk materials- a novel HDPE membrane filter designed for EUV Lithography
High-NA EUV lithography exposure tool- key advantages and program progress
Highly fluorinated alternating copolymer possessing high glass transition temperature and cross-linking capabilities under extreme UV radiation
Hybrid resist synthesis by ex-situ vapor-phase infiltration of metal oxides into conventional organic resists
Imaging enhancement (low k1 imaging) in EUV lithography- current status and future resolution enhancement techniques
Improved non-CAR type hemicellulose resists for EUV lithography
Investigation into a prototype EUV attenuated phase-shift mask
Investigation of waveguide modes in EUV mask absorbers
Mask is key to unlock full EUVL potential
Measuring EUV mask
Micro LED displays- technology and manufacturing challenges
Multidimensional process optimization of a negative e-beam photoresist for silicon-waveguide manufacturing
Nano-scale effects of selective spin-on deposition
Nanophotonics as computing machines
A new era for AI HPC and IC technologies in the transition to an intelligent digital world
Next generation purification method for achieving low trace metals in ultra-high purity chemicals
Novel Patterning
Optical design of EUV attenuated PSM for contact-hole applications
Optical Lithography
An Outpost of Progress
Patterning Materials
Post-Moore- prospects for novel patterning of low volume ICs
Preventing method of volume expansion of polymer after metal infiltration
Probing ion diffusion in chemically amplified resists through experiments and atomistic simulations
Progress and challenges of EUV patterning material design
Progress in EUV-Interference Lithography resist screening towards the deployment of high-NA lithography
Reducing the absorbance of a high etch resistant spin-on carbon hardmask
Self-aligned double pattern process using DSA pattern
Spatial arrangement of block copolymer nanopatterns using photoactive homopolymer substrates
Statistical analysis of the impact of 2D reticle variability on wafer variability in advanced EUV nodes using large-scale Monte Carlo simulations
Top-coats for scalable nano-manufacturing with high-Ο block copolymers in lithographic applications